A modified version of the standard step cooled LPE growth process is described for the growth of visible-spectrum In
1-xGa
xP
1-zAs
zdouble-heterostructure (DH) lasers on GaAs
1-yP
y(

). The quality of the quaternary epitaxial layers is improved by growing a "thick" uniform active region (∼1000 Å) by means of a multiple-layer stack of "thin" (∼100 Å) layers. Each of the "thin" layers grown (cyclically) from an equilibrium melt in the short growth period of <100 ms does not make a transition to the diffusion-limited conditions employed in standard LPE growth processes. This method of liquid-phase epitaxy has been used to grow In
1-xGa
xP
1-zAs
z-In
1-x\´Ga
x\´- P
1-z\´As
z\´(

) DH\´s that operate as photopumped CW 300 K lasers at

Å.