• DocumentCode
    1088538
  • Title

    On the current-voltage characteristics of n+-p-p+diodes

  • Author

    Chuang, C.T.

  • Author_Institution
    IBM Thomas J. Watson Research Center, Yorktown Heights, NY
  • Volume
    30
  • Issue
    12
  • fYear
    1983
  • fDate
    12/1/1983 12:00:00 AM
  • Firstpage
    1709
  • Lastpage
    1716
  • Abstract
    The J-V characteristics of n+-p-p+diodes are analyzed based on the assumption of negligible recombination in the lowly-doped base. The analysis represents a generalization of the approach used by Mertens et al. [1] for high-injection conditions and is valid for all injection levels. Two coupled nonlinear equations from which the J-V characteristics can be calculated are derived. It is shown that under high-injection conditions the equations reduce to those by Mertens et al. For low-injection conditions the electron current density Jnand hole current density Jpare decoupled and single equations are obtained for Jnand Jp, respectively. For the case where the back side contact approaches an ohmic contact, the classical equation for a short-base diode results. The analysis is justified by very close correspondence with exact numerical calculations using the Finite Element Device Analysis Program (FIELDAY).
  • Keywords
    Current density; Current-voltage characteristics; Diodes; Doping; Electrons; Nonlinear equations; P-n junctions; Silicon; Space charge; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1983.21435
  • Filename
    1483336