DocumentCode
1088538
Title
On the current-voltage characteristics of n+-p-p+diodes
Author
Chuang, C.T.
Author_Institution
IBM Thomas J. Watson Research Center, Yorktown Heights, NY
Volume
30
Issue
12
fYear
1983
fDate
12/1/1983 12:00:00 AM
Firstpage
1709
Lastpage
1716
Abstract
The
characteristics of n+-p-p+diodes are analyzed based on the assumption of negligible recombination in the lowly-doped base. The analysis represents a generalization of the approach used by Mertens et al. [1] for high-injection conditions and is valid for all injection levels. Two coupled nonlinear equations from which the
characteristics can be calculated are derived. It is shown that under high-injection conditions the equations reduce to those by Mertens et al. For low-injection conditions the electron current density Jn and hole current density Jp are decoupled and single equations are obtained for Jn and Jp , respectively. For the case where the back side contact approaches an ohmic contact, the classical equation for a short-base diode results. The analysis is justified by very close correspondence with exact numerical calculations using the Finite Element Device Analysis Program (FIELDAY).
characteristics of n+-p-p+diodes are analyzed based on the assumption of negligible recombination in the lowly-doped base. The analysis represents a generalization of the approach used by Mertens et al. [1] for high-injection conditions and is valid for all injection levels. Two coupled nonlinear equations from which the
characteristics can be calculated are derived. It is shown that under high-injection conditions the equations reduce to those by Mertens et al. For low-injection conditions the electron current density JKeywords
Current density; Current-voltage characteristics; Diodes; Doping; Electrons; Nonlinear equations; P-n junctions; Silicon; Space charge; Voltage;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1983.21435
Filename
1483336
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