DocumentCode
1088870
Title
Flat surface circular buried heterostructure surface emitting laser with highly reflective Si/SiO2 mirrors
Author
Oshikiri, M. ; Koyama, Fumio ; Iga, Kenichi
Author_Institution
Precision & Intelligence Lab., Tokyo Inst. of Technol., Yokohama, Japan
Volume
27
Issue
22
fYear
1991
Firstpage
2038
Lastpage
2039
Abstract
The threshold has been reduced and +0.2 degrees C pulsed operation (Ith=150 mA) has been obtained for a flat surface buried heterostructure 1.3 mu m surface emitting laser. An in situ optical thickness monitor system was introduced into an electron beam evaporator to improve the optical thickness accuracy. 98-99% reflectivities have been obtained in Si/SiO2 multilayer reflectors.
Keywords
laser cavity resonators; mirrors; semiconductor junction lasers; 1.3 micron; 150 mA; 98 to 99 percent; Si-SiO 2 multilayer mirrors; buried heterostructure surface emitting laser; electron beam evaporator; flat surface circular buried heterostructure; highly reflective mirrors; in situ optical thickness monitor system; optical thickness accuracy; pulsed operation; reflectivities; surface emitting laser;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19911262
Filename
132977
Link To Document