• DocumentCode
    1088903
  • Title

    Contrast enhanced photolithography

  • Author

    Griffing, B.F. ; West, P.R.

  • Author_Institution
    General Electric Corporate Research Laboratory, Schenectady, NY
  • Volume
    4
  • Issue
    1
  • fYear
    1983
  • fDate
    1/1/1983 12:00:00 AM
  • Firstpage
    14
  • Lastpage
    16
  • Abstract
    This paper introduces a new method, contrast enhancement, which improves the imaging properties of conventional photoresist through the use of a photobleachable layer applied to the resist surface. Contrast enhancement allows high contrast photopatterns to be formed even when low contrast illumination is used. A short discussion of the theory and an experimental demonstration of the method are presented.
  • Keywords
    Circuits; Frequency; Lighting; Lithography; Optical imaging; Optical materials; Photobleaching; Resists; Spatial resolution; Transfer functions;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/EDL.1983.25629
  • Filename
    1483373
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1088903