The effect of interface grading around the active layer in DH (Ga, Al) As near-visible lasers (

nm) has been investigated for Ge and Sn as p- and n-type dopants. The combination of graded transition layers with a rather high Al and Ge concentration gives rise to a high effective interface recombination velocity (

cm/s) due to carrier loss in the highly Ge-doped p-Ga
0.55Al
0.45As cladding layer. The chemical width

of the transition layers is determined by SIMS and SAES and found to range between 50 and 2.5 nm. The latter extremely steep interfaces have been grown in a novel LPE growth system. The threshold current density and its temperature sensitivity, in terms of the exponential relationship

improve significantly with abrupt junctions. From this material 5 μm proton-bombarded stripe lasers with a threshold current of ∼90 mA and a

K at 780 nm have been fabricated.