DocumentCode :
1088976
Title :
The influence of interface grading on threshold current density of (near) visible DH(Ga,Al)As lasers
Author :
Nijman, Willem ; Leswin, Willem J. ; Thijs, Peter
Author_Institution :
Philips Research Labs., Eindhoven, The Netherlands
Volume :
17
Issue :
5
fYear :
1981
fDate :
5/1/1981 12:00:00 AM
Firstpage :
767
Lastpage :
775
Abstract :
The effect of interface grading around the active layer in DH (Ga, Al) As near-visible lasers ( \\lambda _{L} \\approx 780 nm) has been investigated for Ge and Sn as p- and n-type dopants. The combination of graded transition layers with a rather high Al and Ge concentration gives rise to a high effective interface recombination velocity ( S l\\sim 4000 cm/s) due to carrier loss in the highly Ge-doped p-Ga0.55Al0.45As cladding layer. The chemical width W\\min{90}\\max {10} of the transition layers is determined by SIMS and SAES and found to range between 50 and 2.5 nm. The latter extremely steep interfaces have been grown in a novel LPE growth system. The threshold current density and its temperature sensitivity, in terms of the exponential relationship J_{th}(T) = J_{0} \\exp (T/T_{0}) improve significantly with abrupt junctions. From this material 5 μm proton-bombarded stripe lasers with a threshold current of ∼90 mA and a T_{0} = 120 K at 780 nm have been fabricated.
Keywords :
Gallium materials/lasers; Semiconductor device doping; Biographies; Heterojunctions; Laser transitions; Lasers and electrooptics; Optical recording; Semiconductor lasers; Temperature distribution; Temperature sensors; Threshold current; Tin;
fLanguage :
English
Journal_Title :
Quantum Electronics, IEEE Journal of
Publisher :
ieee
ISSN :
0018-9197
Type :
jour
DOI :
10.1109/JQE.1981.1071172
Filename :
1071172
Link To Document :
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