DocumentCode :
1089003
Title :
Glow discharge processes; Sputtering and plasma etching
Author :
Ferrar, C.
Author_Institution :
United Aircraft Research Labs., East Harford, CT, USA
Volume :
17
Issue :
5
fYear :
1981
fDate :
5/1/1981 12:00:00 AM
Firstpage :
817
Lastpage :
817
Keywords :
Book reviews; Glow discharges; Plasma materials processing; Sputtering; Books; Glow discharges; Magnetic materials; Mathematics; Plasma applications; Plasma chemistry; Plasma materials processing; Radio frequency; Sputter etching; Sputtering;
fLanguage :
English
Journal_Title :
Quantum Electronics, IEEE Journal of
Publisher :
ieee
ISSN :
0018-9197
Type :
jour
DOI :
10.1109/JQE.1981.1071175
Filename :
1071175
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=1089003
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