• DocumentCode
    1089195
  • Title

    A corrugated capacitor cell (CCC) for megabit dynamic MOS memories

  • Author

    Sunami, H. ; Kure, T. ; Hashimoto, N. ; Itoh, K. ; Toyabe, T. ; Asai, S.

  • Author_Institution
    Central Research Laboratory, Hitachi Ltd., Kokubunji, Tokyo, Japan
  • Volume
    4
  • Issue
    4
  • fYear
    1983
  • fDate
    4/1/1983 12:00:00 AM
  • Firstpage
    90
  • Lastpage
    91
  • Abstract
    A new dRAM cell named "CCC" (Corrugated Capacitor Cell) has been successfully developed based on the one-device cell concept. This CCC is characterized by an etched-moat storage-capacitor extended into the substrate, resulting in an almost independent increase in storage capacitance without cell size enlargement. A typical value of 45 fF has been obtained with 4 × 8 µm2CCC having a 2.5-µm deep moat and a capacitor insulator equivalent to 15 nm SiO2in thickness. A signal of 200 mV is realized in 32 kbit dRAM operation with a folded-bit line arrangement having 128 bit identical CCC\´s. The CCC concept is promising for generations of 1 Mbit dRAM\´s and beyond.
  • Keywords
    Alpha particles; Capacitance; Dry etching; Electronics packaging; Electrons; Insulation; MOS capacitors; Sputter etching; Substrates; Wet etching;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/EDL.1983.25659
  • Filename
    1483403