DocumentCode
1089285
Title
Subthreshold current in oxide isolated structures
Author
Sugino, M. ; Akers, L.A.
Author_Institution
Semiconductor Research and Development Laboratory, Motorola, Phoenix, AZ
Volume
4
Issue
4
fYear
1983
fDate
4/1/1983 12:00:00 AM
Firstpage
114
Lastpage
115
Abstract
The effects of the shape of the sidewall oxide isolation on threshold voltage and subthreshold current is discussed. The interface charge is found to significantly alter subthreshold current.
Keywords
Laplace equations; MOS devices; MOSFET circuits; Mesh generation; Shape; Silicon; Subthreshold current; Threshold current; Threshold voltage;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/EDL.1983.25668
Filename
1483412
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