DocumentCode :
1089392
Title :
Use of tin oxide as an inexpensive antireflection coating for p on n polycrystalline silicon solar cells
Author :
Chakravarty, B.C. ; Singh, S.N. ; Das, B.K.
Author_Institution :
National Physical Laboratory, New Delhi, India
Volume :
4
Issue :
5
fYear :
1983
fDate :
5/1/1983 12:00:00 AM
Firstpage :
138
Lastpage :
139
Abstract :
The potential of tin oxide as an inexpensive antireflection (AR) coating for polycrystalline silicon solar cells has been investigated. Undoped tin oxide films of a desired thickness were deposited over p on n polycrystalline silicon solar cells by spray pyrolysis of an alcoholic solution of hydrated stannic chloride at 500°C. Evaluation of cell performance before and after this AR coating showed that the AR coating is highly compatible with the polycrystalline silicon solar cells. About 40-50 percent improvement in the short-circuit current of p on n polycrystalline cells has been measured. The coating may be highly suited to large-scale production of low-cost polycrystalline silicon solar cells for terrestrial application.
Keywords :
Alcoholism; Coatings; Current measurement; Large-scale systems; Photovoltaic cells; Production; Semiconductor films; Silicon; Spraying; Tin;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/EDL.1983.25679
Filename :
1483423
Link To Document :
بازگشت