• DocumentCode
    1091063
  • Title

    Parasitic MESFET in (Al, Ga) As/GaAs modulation doped FET´s and MODFET characterization

  • Author

    Lee, Kwyro ; Shur, Michael S. ; Drummond, Timothy J. ; Morkoç, Hadis

  • Author_Institution
    University of Minnesota, Minneapolis, MN
  • Volume
    31
  • Issue
    1
  • fYear
    1984
  • fDate
    1/1/1984 12:00:00 AM
  • Firstpage
    29
  • Lastpage
    35
  • Abstract
    A charge-control model for n-channel modulation doped FET´s (MODFET´s) is extended to include the drain-to-source current through the doped (Al, Ga)As layer which becomes important for large positive gate voltages. This parasitic conduction leads to decreased device transconductances at high gate voltages. A unified and complete characterization technique for deducing the parameters of our model is introduced and used for the device characterization. Parameters, e.g., the saturation velocity, two-dimensional gas concentration at equilibrium, thickness of the doped (Al, Ga)As layer, etc., deduced using the model, are in good agreement with the independent calculations and measurements. However, the deduced values of the room-temperature low field mobility of the two-dimensional electron gas are considerably smaller than those measured by Hall effect and in long-gate MODFET´s. This model is in good agreement with the characteristics of high-current normally on MODFET´s. The maximum measured current swing of 300 mA/mm gate is reported.
  • Keywords
    Electron mobility; Epitaxial layers; FETs; Gallium arsenide; HEMTs; MESFETs; MODFETs; Thickness measurement; Velocity measurement; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1984.21470
  • Filename
    1483755