DocumentCode
1091063
Title
Parasitic MESFET in (Al, Ga) As/GaAs modulation doped FET´s and MODFET characterization
Author
Lee, Kwyro ; Shur, Michael S. ; Drummond, Timothy J. ; Morkoç, Hadis
Author_Institution
University of Minnesota, Minneapolis, MN
Volume
31
Issue
1
fYear
1984
fDate
1/1/1984 12:00:00 AM
Firstpage
29
Lastpage
35
Abstract
A charge-control model for n-channel modulation doped FET´s (MODFET´s) is extended to include the drain-to-source current through the doped (Al, Ga)As layer which becomes important for large positive gate voltages. This parasitic conduction leads to decreased device transconductances at high gate voltages. A unified and complete characterization technique for deducing the parameters of our model is introduced and used for the device characterization. Parameters, e.g., the saturation velocity, two-dimensional gas concentration at equilibrium, thickness of the doped (Al, Ga)As layer, etc., deduced using the model, are in good agreement with the independent calculations and measurements. However, the deduced values of the room-temperature low field mobility of the two-dimensional electron gas are considerably smaller than those measured by Hall effect and in long-gate MODFET´s. This model is in good agreement with the characteristics of high-current normally on MODFET´s. The maximum measured current swing of 300 mA/mm gate is reported.
Keywords
Electron mobility; Epitaxial layers; FETs; Gallium arsenide; HEMTs; MESFETs; MODFETs; Thickness measurement; Velocity measurement; Voltage;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1984.21470
Filename
1483755
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