• DocumentCode
    1091237
  • Title

    LiNbO3waveguide modulator with 1.2 µm thick electrodes fabricated by lift-off technique

  • Author

    Liu, Pao-Lo

  • Author_Institution
    State University of New York at Buffalo, Amherst, NY, USA
  • Volume
    18
  • Issue
    10
  • fYear
    1982
  • fDate
    10/1/1982 12:00:00 AM
  • Firstpage
    1780
  • Lastpage
    1782
  • Abstract
    In order to make efficient high-frequency electrooptic modulators, the microwave loss in the electrodes has to be minimized. A lift-off technique using chlorobenzene to harden the top of AZ1350-J photoresist was adopted to fabricate 1.2 μm thick metal electrodes. A 1 cm long, 15 μm wide strip electrode has a dc resistance of 11 Ω, which is substantially less than that of the 2000 Å thick electrodes routinely fabricated. A 1 cm long traveling-wave phase modulator consisting of a single waveguide was tested. The measured -3 dB bandwidth is 3.8 GHz.
  • Keywords
    Electrooptic modulation; Optical strip waveguide components; Traveling-wave devices; Electrodes; Optical beams; Optical buffering; Optical modulation; Optical noise; Optical polarization; Optical waveguides; Reflection; Resists; Strips;
  • fLanguage
    English
  • Journal_Title
    Quantum Electronics, IEEE Journal of
  • Publisher
    ieee
  • ISSN
    0018-9197
  • Type

    jour

  • DOI
    10.1109/JQE.1982.1071391
  • Filename
    1071391