DocumentCode
1091237
Title
LiNbO3 waveguide modulator with 1.2 µm thick electrodes fabricated by lift-off technique
Author
Liu, Pao-Lo
Author_Institution
State University of New York at Buffalo, Amherst, NY, USA
Volume
18
Issue
10
fYear
1982
fDate
10/1/1982 12:00:00 AM
Firstpage
1780
Lastpage
1782
Abstract
In order to make efficient high-frequency electrooptic modulators, the microwave loss in the electrodes has to be minimized. A lift-off technique using chlorobenzene to harden the top of AZ1350-J photoresist was adopted to fabricate 1.2 μm thick metal electrodes. A 1 cm long, 15 μm wide strip electrode has a dc resistance of 11 Ω, which is substantially less than that of the 2000 Å thick electrodes routinely fabricated. A 1 cm long traveling-wave phase modulator consisting of a single waveguide was tested. The measured -3 dB bandwidth is 3.8 GHz.
Keywords
Electrooptic modulation; Optical strip waveguide components; Traveling-wave devices; Electrodes; Optical beams; Optical buffering; Optical modulation; Optical noise; Optical polarization; Optical waveguides; Reflection; Resists; Strips;
fLanguage
English
Journal_Title
Quantum Electronics, IEEE Journal of
Publisher
ieee
ISSN
0018-9197
Type
jour
DOI
10.1109/JQE.1982.1071391
Filename
1071391
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