DocumentCode :
1091368
Title :
A three-dimensional CMOS design methodology
Author :
Hoefflinger, Bernd ; Liu, Sie T. ; Vajdic, Branislav
Author_Institution :
Purdue University, West Lafayette, IN
Volume :
31
Issue :
2
fYear :
1984
fDate :
2/1/1984 12:00:00 AM
Firstpage :
171
Lastpage :
173
Abstract :
A technology-updatable design methodology for three-dimensional (3-D) CMOS circuits has been developed. Four levels of abstraction have been implemented with topographical congruence: 1) technology level, 2) mask level, 3) transistor level, and 4) logic level. A novel transistor level symbolic representation is introduced which emphasizes the three-dimensional nature of the circuits. A number of design examples is presented.
Keywords :
CMOS logic circuits; CMOS technology; Design methodology; Insulation; Inverters; Isolation technology; Logic devices; Silicon on insulator technology; Surfaces; Thin film transistors;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1984.21496
Filename :
1483781
Link To Document :
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