• DocumentCode
    1091807
  • Title

    Current-voltage characteristics of thin-film SOI MOSFET´s in strong inversion

  • Author

    Lim, Hyung-Kyu ; Fossum, Jerry G.

  • Author_Institution
    University of Florida, Gainesville, FL
  • Volume
    31
  • Issue
    4
  • fYear
    1984
  • fDate
    4/1/1984 12:00:00 AM
  • Firstpage
    401
  • Lastpage
    408
  • Abstract
    A simple analytic model for the steady-state current-voltage characteristics of strongly inverted silicon-on-insulator (SOI) MOSFET´s is developed. The model, simplified by a key approximation that the inversion charge density is described well by a linear function of the Surface potential, clearly shows the dependence of the drain current on the device parameters and on the terminal voltages, including the back-gate (substrate) bias. The analysis is supported by measurements of current-voltage characteristics of thin-film (laser-recrystallized) SOI MOSFET´s. The dependence of carrier mobility on the terminal voltages, especially the back-gate bias, is analyzed and shown to underlie discrepancies between the theoretical (constant mobility) and experimental results at high gate voltages. The mobility dependence on the back-gate bias enhances the strong influence of the back gate on the drain current, especially when the device is saturated.
  • Keywords
    Current-voltage characteristics; Doping; MOSFET circuits; Semiconductor films; Semiconductor process modeling; Silicon on insulator technology; Steady-state; Substrates; Transistors; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1984.21540
  • Filename
    1483825