DocumentCode
1091836
Title
A new vertical double diffused MOSFET—The self-aligned terraced-gate MOSFET
Author
Ueda, Daisuke ; Takagi, Hiromitsu ; Kano, Gota
Author_Institution
Matsushita Electronics Corporation, Osaka, Japan
Volume
31
Issue
4
fYear
1984
fDate
4/1/1984 12:00:00 AM
Firstpage
416
Lastpage
420
Abstract
A new power MOSFET structure with a Self-aligned Terraced Gate (STGMOSFET) is demonstrated. The unique gate structure of the STGMOSFET reduces the parasitic gate capacitances, resulting in improved high-frequency performance. The STGMOSFET structure was used to design a 3.5 mm × 3.5 mm transistor. This chip had an on-resistance of 2.3 Ω and a 500-V source-drain breakdown voltage. It exhibited excellent high-frequency performance with a cut-off frequency of 100 MHz, and rise and fall times of 5 and 20 nS, respectively.
Keywords
Cutoff frequency; Electrodes; Fabrication; Immune system; Impedance; Lapping; MOSFET circuits; Parasitic capacitance; Power MOSFET; Temperature;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1984.21543
Filename
1483828
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