• DocumentCode
    1091836
  • Title

    A new vertical double diffused MOSFET—The self-aligned terraced-gate MOSFET

  • Author

    Ueda, Daisuke ; Takagi, Hiromitsu ; Kano, Gota

  • Author_Institution
    Matsushita Electronics Corporation, Osaka, Japan
  • Volume
    31
  • Issue
    4
  • fYear
    1984
  • fDate
    4/1/1984 12:00:00 AM
  • Firstpage
    416
  • Lastpage
    420
  • Abstract
    A new power MOSFET structure with a Self-aligned Terraced Gate (STGMOSFET) is demonstrated. The unique gate structure of the STGMOSFET reduces the parasitic gate capacitances, resulting in improved high-frequency performance. The STGMOSFET structure was used to design a 3.5 mm × 3.5 mm transistor. This chip had an on-resistance of 2.3 Ω and a 500-V source-drain breakdown voltage. It exhibited excellent high-frequency performance with a cut-off frequency of 100 MHz, and rise and fall times of 5 and 20 nS, respectively.
  • Keywords
    Cutoff frequency; Electrodes; Fabrication; Immune system; Impedance; Lapping; MOSFET circuits; Parasitic capacitance; Power MOSFET; Temperature;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1984.21543
  • Filename
    1483828