DocumentCode :
1091855
Title :
Channel potential and channel width in narrow buried-channel MOSFET´s
Author :
Burkey, Bruce C. ; Lubberts, Gerrit ; Trabk, Eugene A. ; Tredwell, Timothy J.
Author_Institution :
Eastman Kodak Company, Rochester, NY
Volume :
31
Issue :
4
fYear :
1984
fDate :
4/1/1984 12:00:00 AM
Firstpage :
423
Lastpage :
429
Abstract :
A new method is described for determining the effective width over which incremental charge spreads in a narrow buried-channel transistor. The method is based on the transconductance in the buried-channel mode. Experimental results for effective widths and channel potential shifts are presented for MOSFET´s with effective channel widths from 2 to 10 µm. Two-dimensional numerical calculations verify the experimental results.
Keywords :
Charge coupled devices; Charge transfer; Doping; FETs; MOSFET circuits; Scanning electron microscopy; Silicon; Threshold voltage; Transconductance; Very large scale integration;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1984.21545
Filename :
1483830
Link To Document :
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