DocumentCode :
1091876
Title :
Improvement in GaAs MESFET drain conductance by a steplike-gate structure
Author :
Tomizawa, Masaaki ; Uchida, Masao ; Sugeta, Takayuki
Author_Institution :
Nippon Telegraph and Telephone Public Corporation, Kanagawa, Japan
Volume :
31
Issue :
4
fYear :
1984
fDate :
4/1/1984 12:00:00 AM
Firstpage :
435
Lastpage :
439
Abstract :
A new steplike-gate GaAs MESFET structure, having a low drain conductance in comparison with a conventional recess structure, is presented. In order to reduce the drain conductance, the device design parameters related to gate structures are optimized using a two-dimensional device simulator. Experimental results obtained from fabricated devices, based on these optimized device parameters, show excellent low drain conductance characteristics. The reduced drain conductance can improve the maximum available gain in high-frequency GaAs analog integrated circuits.
Keywords :
Analog integrated circuits; Circuit simulation; Electrodes; Electrons; Gallium arsenide; MESFETs; Telegraphy; Telephony; Transconductance; Voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1984.21547
Filename :
1483832
Link To Document :
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