• DocumentCode
    1091916
  • Title

    Recombination lifetime using the pulsed MOS capacitor

  • Author

    Schroder, Dieter K. ; Whitfield, Jamis D. ; Varker, Charles J.

  • Author_Institution
    Arizona State University, Tempe, AZ
  • Volume
    31
  • Issue
    4
  • fYear
    1984
  • fDate
    4/1/1984 12:00:00 AM
  • Firstpage
    462
  • Lastpage
    467
  • Abstract
    The pulsed MOS capacitor is routinely used to measure the generation lifetime. A new technique is described here in which the same device is used to obtain the recombination lifetime. The measurement technique is identical to the commonly used pulsed C-t method except that the device is operated at an elevated temperature of 70- 100°C, where quasi-neutral current originating below the space-charge region dominates over space-charge region currents. The new technique, coupled with established techniques, makes possible the simultaneous determination of τgand τr.
  • Keywords
    Character generation; Lifetime estimation; MOS capacitors; P-n junctions; Photoconducting materials; Pulse measurements; Radiative recombination; Semiconductor diodes; Voltage control; Volume measurement;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1984.21551
  • Filename
    1483836