DocumentCode
1091916
Title
Recombination lifetime using the pulsed MOS capacitor
Author
Schroder, Dieter K. ; Whitfield, Jamis D. ; Varker, Charles J.
Author_Institution
Arizona State University, Tempe, AZ
Volume
31
Issue
4
fYear
1984
fDate
4/1/1984 12:00:00 AM
Firstpage
462
Lastpage
467
Abstract
The pulsed MOS capacitor is routinely used to measure the generation lifetime. A new technique is described here in which the same device is used to obtain the recombination lifetime. The measurement technique is identical to the commonly used pulsed C-t method except that the device is operated at an elevated temperature of 70- 100°C, where quasi-neutral current originating below the space-charge region dominates over space-charge region currents. The new technique, coupled with established techniques, makes possible the simultaneous determination of τg and τr .
Keywords
Character generation; Lifetime estimation; MOS capacitors; P-n junctions; Photoconducting materials; Pulse measurements; Radiative recombination; Semiconductor diodes; Voltage control; Volume measurement;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1984.21551
Filename
1483836
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