DocumentCode
1092029
Title
Self-learning fuzzy logic system for in situ, in-process diagnostics of mass flow controller (MFC)
Author
Ramamurthi, Ram K.
Author_Institution
Semicond. Process & Design Center, Texas Instrum. Inc., Dallas, TX, USA
Volume
7
Issue
1
fYear
1994
fDate
2/1/1994 12:00:00 AM
Firstpage
42
Lastpage
52
Abstract
An improvement in the yield of better quality wafers requires an accurate control of various process variables. The control should include timely diagnosis and appropriate in-situ, in-process adjustments for drifts in these variables. One such scheme, a self-learning fuzzy logic system, is developed in this study for correcting drifts in the calibration of mass flow controllers (MFC´s) that control the flow of gases into a process chamber. It consists of two components; a diagnostic system and a self-learning system. The diagnostic system uses fuzzy logic to diagnose the problem and initiate suitable remedial action, The self-learning system automatically builds the knowledge base used for diagnosis. The knowledge base is initialized using clustering principle and is tuned for better performance using a set of heuristic rules. The system is capable of learning the behavior of different types of makes and models of MFC´s under various flow rates. It has been tested on two different types of MFC´s under different flow rates and encouraging results have been obtained
Keywords
calibration; diagnostic expert systems; flow control; fuzzy control; fuzzy logic; integrated circuit manufacture; intelligent control; learning systems; process computer control; self-adjusting systems; semiconductor device manufacture; calibration drift correction; clustering principle; fuzzy logic system; gas flow control; heuristic rules; in situ in-process diagnostics; knowledge base; mass flow controller; process chamber; self-learning system; wafer yield improvement; Automatic control; Autoregressive processes; Control systems; Fuzzy logic; Manufacturing processes; Process control; Semiconductor device modeling; Semiconductor process modeling; Testing; Weight control;
fLanguage
English
Journal_Title
Semiconductor Manufacturing, IEEE Transactions on
Publisher
ieee
ISSN
0894-6507
Type
jour
DOI
10.1109/66.286827
Filename
286827
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