DocumentCode
1092581
Title
Threshold voltage scattering of GaAs MESFET´s fabricated on LEC-grown semi-insulating substrates
Author
Ishii, Yasunobu ; Miyazawa, Shintaro ; Ishida, Satoru
Author_Institution
Nippon Telegraph and Telephone Public Corporation, Kanagawa, Japan
Volume
31
Issue
6
fYear
1984
fDate
6/1/1984 12:00:00 AM
Firstpage
800
Lastpage
804
Abstract
Threshold voltage standard deviation (
) for MESFET\´s on a liquid encapsulated Czochralski (LEC) grown GaAs wafer was investigated, in connection with dislocation distribution. Threshold voltage (Vth ) scattering was found to be strongly correlated to the dislocation cell network structure in the substrate. This dislocation cell network is characteristic of the LEC-grown crystal. At large
region, strongly networked dislocation cell structure was observed. In the area where dislocations distributed randomly without network structure,
was small in spite of high dislocation density. For FET\´s located in the dislocation-free region inside the network cell, low drain current Ids and high Vth were recognized directly by a curve tracer. The experimental results regarding the dislocation network effect on Vth scattering are discussed along with cathodoluminescence study results.
) for MESFET\´s on a liquid encapsulated Czochralski (LEC) grown GaAs wafer was investigated, in connection with dislocation distribution. Threshold voltage (V
region, strongly networked dislocation cell structure was observed. In the area where dislocations distributed randomly without network structure,
was small in spite of high dislocation density. For FET\´s located in the dislocation-free region inside the network cell, low drain current IKeywords
Crystals; FETs; Fabrication; Gallium arsenide; Ion implantation; Light scattering; Logic circuits; MESFETs; Substrates; Threshold voltage;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1984.21610
Filename
1483895
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