• DocumentCode
    1092581
  • Title

    Threshold voltage scattering of GaAs MESFET´s fabricated on LEC-grown semi-insulating substrates

  • Author

    Ishii, Yasunobu ; Miyazawa, Shintaro ; Ishida, Satoru

  • Author_Institution
    Nippon Telegraph and Telephone Public Corporation, Kanagawa, Japan
  • Volume
    31
  • Issue
    6
  • fYear
    1984
  • fDate
    6/1/1984 12:00:00 AM
  • Firstpage
    800
  • Lastpage
    804
  • Abstract
    Threshold voltage standard deviation ( \\sigma V_{th} ) for MESFET\´s on a liquid encapsulated Czochralski (LEC) grown GaAs wafer was investigated, in connection with dislocation distribution. Threshold voltage (Vth) scattering was found to be strongly correlated to the dislocation cell network structure in the substrate. This dislocation cell network is characteristic of the LEC-grown crystal. At large \\sigma V_{th} region, strongly networked dislocation cell structure was observed. In the area where dislocations distributed randomly without network structure, \\sigma V_{th} was small in spite of high dislocation density. For FET\´s located in the dislocation-free region inside the network cell, low drain current Idsand high Vthwere recognized directly by a curve tracer. The experimental results regarding the dislocation network effect on Vthscattering are discussed along with cathodoluminescence study results.
  • Keywords
    Crystals; FETs; Fabrication; Gallium arsenide; Ion implantation; Light scattering; Logic circuits; MESFETs; Substrates; Threshold voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1984.21610
  • Filename
    1483895