DocumentCode :
1092739
Title :
Breakdowns in Si JFET´s
Author :
Sakai, Tatsuo ; Sakina, Yasuaki ; Hane, Kunio ; Suzuk, Tokio
Author_Institution :
Keio University, Yokohama, Japan
Volume :
31
Issue :
7
fYear :
1984
fDate :
7/1/1984 12:00:00 AM
Firstpage :
873
Lastpage :
879
Abstract :
A two-dimensional numerical analysis to clarify the breakdown phenomena in Si n-type JFET is described. In this analysis, the continuity equation for minority carriers is introduced to consider the effect of avalanche multiplication. The heat conduction equation is also taken into account to include the thermal effect on the breakdown voltage. The results obtained are: 1) the mechanisms of excess gate current (EGC), current-mode second breakdown (CSB), and thermal-mode second breakdown (TSB). 2) The effects of how channel impurity concentration Nc, drain current ID, and applied drain voltage VDGaffect EGC, CSB, and TSB are also reported.
Keywords :
Breakdown voltage; Charge carrier processes; Degradation; Delay effects; Electric breakdown; Electron mobility; Impedance; Impurities; Poisson equations; Thermal conductivity;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1984.21624
Filename :
1483909
Link To Document :
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