DocumentCode
1093143
Title
Dislocations as the origin of threshold voltage scatterings for GaAs MESFET on LEC-grown semi-insulating GaAs substrate
Author
Miyazawa, Shintaro ; Ishii, Yasunobu
Author_Institution
Nippon Telegraph and Telephone Public Corporation, Kanagawa, Japan
Volume
31
Issue
8
fYear
1984
fDate
8/1/1984 12:00:00 AM
Firstpage
1057
Lastpage
1062
Abstract
This paper describes the extended results on the influence of dislocations in liquid-encapsulated Czochralski (LEC) grown semi-insulating GaAs substrates on threshold voltage of GaAs MESFET´s. MESFET´s located less than about 50 µm from a dislocation exhibit threshold voltage lower than those far from a dislocation and threshold voltage scatters at less than about 30 µm from a dislocation. The scattering is considered briefly from anisotropy of stress field around dislocations. Particular interest is devoted to the electrical properties around dislocations because of their detrimental influence on the FET threshold voltage.
Keywords
Crystals; Etching; FETs; Gallium arsenide; Gold; Lithography; MESFETs; Scattering; Substrates; Threshold voltage;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1984.21660
Filename
1483945
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