• DocumentCode
    1093353
  • Title

    Comparison of intrinsic gettering and epitaxial wafers in terms of soft error endurance and other characteristics of 64k bit dynamic RAM

  • Author

    Iwai, Hiroshi ; Otsuka, Hideo ; Matsumoto, Yasuo ; Hisatomi, Kiyoshi ; Aoki, Kyoji

  • Author_Institution
    Stanford University, Stanford, CA
  • Volume
    31
  • Issue
    9
  • fYear
    1984
  • fDate
    9/1/1984 12:00:00 AM
  • Firstpage
    1149
  • Lastpage
    1151
  • Abstract
    Intrinsic gettering (IG) and P/P+epitaxial wafers are compared in terms of soft error endurance and other characteristics of a 64k bit dynamic RAM. It was confirmed that soft error rate is improved in IG wafers, while it is deteriorated in P/P+epitaxial wafers. However, when epitaxial layer thickness is reduced to a certain value, the soft error rate tends to be improved. Several other characteristics of 64k bit DRAM´s were also evaluated for devices made on IG and epitaxial wafers with various denuded zone (DZ) widths and epitaxial layer thicknesses, respectively.
  • Keywords
    Capacitors; Conductivity; DRAM chips; Degradation; Epitaxial layers; Error analysis; Gettering; Laboratories; Silicon; Substrates;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1984.21679
  • Filename
    1483964