Title : 
Comparison of intrinsic gettering and epitaxial wafers in terms of soft error endurance and other characteristics of 64k bit dynamic RAM
         
        
            Author : 
Iwai, Hiroshi ; Otsuka, Hideo ; Matsumoto, Yasuo ; Hisatomi, Kiyoshi ; Aoki, Kyoji
         
        
            Author_Institution : 
Stanford University, Stanford, CA
         
        
        
        
        
            fDate : 
9/1/1984 12:00:00 AM
         
        
        
        
            Abstract : 
Intrinsic gettering (IG) and P/P+epitaxial wafers are compared in terms of soft error endurance and other characteristics of a 64k bit dynamic RAM. It was confirmed that soft error rate is improved in IG wafers, while it is deteriorated in P/P+epitaxial wafers. However, when epitaxial layer thickness is reduced to a certain value, the soft error rate tends to be improved. Several other characteristics of 64k bit DRAM´s were also evaluated for devices made on IG and epitaxial wafers with various denuded zone (DZ) widths and epitaxial layer thicknesses, respectively.
         
        
            Keywords : 
Capacitors; Conductivity; DRAM chips; Degradation; Epitaxial layers; Error analysis; Gettering; Laboratories; Silicon; Substrates;
         
        
        
            Journal_Title : 
Electron Devices, IEEE Transactions on
         
        
        
        
        
            DOI : 
10.1109/T-ED.1984.21679