• DocumentCode
    1093370
  • Title

    A time- and temperature-dependent 2-D simulation of the GTO thyristor turn-off process

  • Author

    Nakagawa, Akio ; Navon, David H.

  • Author_Institution
    Toshiba Research and Development Center, Kawasaki, Japan
  • Volume
    31
  • Issue
    9
  • fYear
    1984
  • fDate
    9/1/1984 12:00:00 AM
  • Firstpage
    1156
  • Lastpage
    1163
  • Abstract
    GTO thyristor turn-off process is analyzed for a resistive load case by performing an exact two-dimensional time- and temperature-dependent numerical simulation. A newly defined concept "on-region" is introduced to help understanding of the simulation results. Excess carrier plasma (on-region) in the p-base is squeezed finally to as narrow as 60 µm wide, accompanying a large current density increase at the center of the middle junction. The carriers in the n-base are found not to be greatly affected by the initial plasma squeezing in the p-base. After the on-region width in the p-base reaches its final limit, the excess carriers around the middle junction of the final on-region is rapidly reduced, resulting in complete anode current turn-off.
  • Keywords
    Anodes; Doping; Equations; Failure analysis; Photonic band gap; Plasma density; Plasma simulation; Semiconductor process modeling; Thyristors; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1984.21681
  • Filename
    1483966