DocumentCode :
1093370
Title :
A time- and temperature-dependent 2-D simulation of the GTO thyristor turn-off process
Author :
Nakagawa, Akio ; Navon, David H.
Author_Institution :
Toshiba Research and Development Center, Kawasaki, Japan
Volume :
31
Issue :
9
fYear :
1984
fDate :
9/1/1984 12:00:00 AM
Firstpage :
1156
Lastpage :
1163
Abstract :
GTO thyristor turn-off process is analyzed for a resistive load case by performing an exact two-dimensional time- and temperature-dependent numerical simulation. A newly defined concept "on-region" is introduced to help understanding of the simulation results. Excess carrier plasma (on-region) in the p-base is squeezed finally to as narrow as 60 µm wide, accompanying a large current density increase at the center of the middle junction. The carriers in the n-base are found not to be greatly affected by the initial plasma squeezing in the p-base. After the on-region width in the p-base reaches its final limit, the excess carriers around the middle junction of the final on-region is rapidly reduced, resulting in complete anode current turn-off.
Keywords :
Anodes; Doping; Equations; Failure analysis; Photonic band gap; Plasma density; Plasma simulation; Semiconductor process modeling; Thyristors; Voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1984.21681
Filename :
1483966
Link To Document :
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