• DocumentCode
    1093782
  • Title

    Charge emission from interface states at silicon grain boundaries by thermal emission and thermionic-field emission—Part II: Experiment

  • Author

    De Groot, A.W. ; Card, Howard C.

  • Author_Institution
    University of Manitoba, Manitoba, Canada
  • Volume
    31
  • Issue
    10
  • fYear
    1984
  • fDate
    10/1/1984 12:00:00 AM
  • Firstpage
    1370
  • Lastpage
    1376
  • Abstract
    Comparison of the theory, developed in Part I of this paper [1], with transient capacitance experiments leads to the conclusion that the interface state energy distribution in grain boundaries is temperature dependent. This conclusion is based on experimental observations of the emission rate over a wide temperature range. One physical interpretation of this result is that contraction of the silicon material at reduced temperatures occurs primarily at the grain boundaries. A further result is that the doping concentration at grain boundaries in cast (Wacker Silso) silicon differs significantly from that in the bulk (inside the grains) of this material.
  • Keywords
    Capacitance measurement; Current measurement; Doping; Grain boundaries; Interface states; Silicon; Strips; Temperature distribution; Thermionic emission; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1984.21718
  • Filename
    1484003