DocumentCode
1093782
Title
Charge emission from interface states at silicon grain boundaries by thermal emission and thermionic-field emission—Part II: Experiment
Author
De Groot, A.W. ; Card, Howard C.
Author_Institution
University of Manitoba, Manitoba, Canada
Volume
31
Issue
10
fYear
1984
fDate
10/1/1984 12:00:00 AM
Firstpage
1370
Lastpage
1376
Abstract
Comparison of the theory, developed in Part I of this paper [1], with transient capacitance experiments leads to the conclusion that the interface state energy distribution in grain boundaries is temperature dependent. This conclusion is based on experimental observations of the emission rate over a wide temperature range. One physical interpretation of this result is that contraction of the silicon material at reduced temperatures occurs primarily at the grain boundaries. A further result is that the doping concentration at grain boundaries in cast (Wacker Silso) silicon differs significantly from that in the bulk (inside the grains) of this material.
Keywords
Capacitance measurement; Current measurement; Doping; Grain boundaries; Interface states; Silicon; Strips; Temperature distribution; Thermionic emission; Voltage;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1984.21718
Filename
1484003
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