• DocumentCode
    1093882
  • Title

    A theoretical explanation of the carrier lifetime as a function of the injection level in gold-doped silicon

  • Author

    Abbas, C. Christiaan

  • Author_Institution
    Brown Boveri Research Center, Baden, Switzerland
  • Volume
    31
  • Issue
    10
  • fYear
    1984
  • fDate
    10/1/1984 12:00:00 AM
  • Firstpage
    1428
  • Lastpage
    1432
  • Abstract
    An expression for the recombination rate in gold-doped silicon is derived taking into account both gold energy levels. This formula shows that the dominant energy level under high-injection conditions is not the midgap gold acceptor, but the gold donor level. The high-low injection lifetime ratio calculated with the derived expression is in good agreement with measured values. This indicates that lifetime and capture cross section measurements are consistent with each other. The relation between gold concentration and high-injection lifetime is calculated. The relative density of the neutral and the negatively and positively charged traps is shown as a function of the carrier injection level.
  • Keywords
    Charge carrier lifetime; Electron emission; Electron traps; Energy states; Gold; Lifetime estimation; Photonic band gap; Radiative recombination; Radioactive decay; Silicon;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1984.21728
  • Filename
    1484013