DocumentCode
1093882
Title
A theoretical explanation of the carrier lifetime as a function of the injection level in gold-doped silicon
Author
Abbas, C. Christiaan
Author_Institution
Brown Boveri Research Center, Baden, Switzerland
Volume
31
Issue
10
fYear
1984
fDate
10/1/1984 12:00:00 AM
Firstpage
1428
Lastpage
1432
Abstract
An expression for the recombination rate in gold-doped silicon is derived taking into account both gold energy levels. This formula shows that the dominant energy level under high-injection conditions is not the midgap gold acceptor, but the gold donor level. The high-low injection lifetime ratio calculated with the derived expression is in good agreement with measured values. This indicates that lifetime and capture cross section measurements are consistent with each other. The relation between gold concentration and high-injection lifetime is calculated. The relative density of the neutral and the negatively and positively charged traps is shown as a function of the carrier injection level.
Keywords
Charge carrier lifetime; Electron emission; Electron traps; Energy states; Gold; Lifetime estimation; Photonic band gap; Radiative recombination; Radioactive decay; Silicon;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1984.21728
Filename
1484013
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