Title :
High reflectivity fibre gratings produced by incubated damage using a 193 nm ArF laser
Author :
Dyer, P.E. ; Farley, R.J. ; Giedl, R. ; Byron, K.C. ; Reid, Dave
Author_Institution :
Dept. of Appl. Phys., Hull Univ.
fDate :
5/26/1994 12:00:00 AM
Abstract :
High reflectivity gratings have been formed in optical fibre using a 193 nm ArF laser irradiated phase mask. Relatively high absorption in the fibre core at this wavelength coupled with an incubation effect in which the absorption grows with repeated exposure allows rapid grating formation (~10 pulses) at modest fluences ~400 m Jcm-2
Keywords :
diffraction gratings; laser beam effects; light absorption; optical fibres; reflectivity; 193 nm; ArF; ArF laser irradiated phase mask; absorption; excimer laser; high reflectivity gratings; incubated damage; optical fibre; rapid grating formation;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19940580
