DocumentCode
1093978
Title
High reflectivity fibre gratings produced by incubated damage using a 193 nm ArF laser
Author
Dyer, P.E. ; Farley, R.J. ; Giedl, R. ; Byron, K.C. ; Reid, Dave
Author_Institution
Dept. of Appl. Phys., Hull Univ.
Volume
30
Issue
11
fYear
1994
fDate
5/26/1994 12:00:00 AM
Firstpage
860
Lastpage
862
Abstract
High reflectivity gratings have been formed in optical fibre using a 193 nm ArF laser irradiated phase mask. Relatively high absorption in the fibre core at this wavelength coupled with an incubation effect in which the absorption grows with repeated exposure allows rapid grating formation (~10 pulses) at modest fluences ~400 m Jcm-2
Keywords
diffraction gratings; laser beam effects; light absorption; optical fibres; reflectivity; 193 nm; ArF; ArF laser irradiated phase mask; absorption; excimer laser; high reflectivity gratings; incubated damage; optical fibre; rapid grating formation;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19940580
Filename
287473
Link To Document