DocumentCode :
1094285
Title :
Scaling and Optimization of MOS Optical Modulators in Nanometer SOI Waveguides
Author :
Passaro, Vittorio M N ; Olio, Francesco Dell
Author_Institution :
Dipt. di Elettrotec. ed Elettron., Politec. di Bari, Bari
Volume :
7
Issue :
4
fYear :
2008
fDate :
7/1/2008 12:00:00 AM
Firstpage :
401
Lastpage :
408
Abstract :
In this paper, a very accurate model of optical modulators in silicon-on-insulator technology is developed and validated using experimental results reported in literature. Using an optimized nanometer MOS structure, a significant bandwidth increase (around 45%), length decrease (around four times), and power consumption reduction (three times) with respect to the state-of-the-art have been obtained.
Keywords :
MIS structures; electro-optical modulation; integrated optics; integrated optoelectronics; micro-optics; nanotechnology; silicon-on-insulator; MOS optical modulators; MOS structure; Si; integrated optics; integrated optoelectronics; nanometer SOI waveguides; power consumption; silicon-on-insulator technology; Integrated optics; MOS capacitors; integrated optics; optical modulation; plasma dispersion effect; plasma-dispersion effect; silicon photonics;
fLanguage :
English
Journal_Title :
Nanotechnology, IEEE Transactions on
Publisher :
ieee
ISSN :
1536-125X
Type :
jour
DOI :
10.1109/TNANO.2008.920207
Filename :
4468042
Link To Document :
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