DocumentCode
1094570
Title
An analytical model for the threshold voltage of a narrow-width MOSFET
Author
Cheng, Y.C. ; Lai, P.T.
Author_Institution
University of Hong Kong, Hong Kong
Volume
31
Issue
12
fYear
1984
fDate
12/1/1984 12:00:00 AM
Firstpage
1814
Lastpage
1823
Abstract
A closed form analytical expression is derived to predict the threshold voltage of a narrow-width MOSFET. The present calculation utilizes the Fourier transform technique to analyze the voltage over the width cross section of the basic MOS device structure. No fitting parameter with experimental data is necessary because the fringe electric field is calculated directly from the relevant physical parameters to deduce the threshold voltage. The dependence of threshold voltage on channel width and substrate bias thus obtained is in reasonable agreement with experimental and numerical results. The effects of field doping and field oxide thickness on the threshold voltage are also taken into consideration. A comparison is made of the present analytical expression for threshold voltage with that, based on an adjustable weighting factor, of earlier analytical models.
Keywords
Analytical models; Doping; Fourier transforms; Geometry; Helium; Hot carrier injection; MOS devices; MOSFET circuits; Threshold voltage; Very large scale integration;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1984.21794
Filename
1484079
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