• DocumentCode
    1094570
  • Title

    An analytical model for the threshold voltage of a narrow-width MOSFET

  • Author

    Cheng, Y.C. ; Lai, P.T.

  • Author_Institution
    University of Hong Kong, Hong Kong
  • Volume
    31
  • Issue
    12
  • fYear
    1984
  • fDate
    12/1/1984 12:00:00 AM
  • Firstpage
    1814
  • Lastpage
    1823
  • Abstract
    A closed form analytical expression is derived to predict the threshold voltage of a narrow-width MOSFET. The present calculation utilizes the Fourier transform technique to analyze the voltage over the width cross section of the basic MOS device structure. No fitting parameter with experimental data is necessary because the fringe electric field is calculated directly from the relevant physical parameters to deduce the threshold voltage. The dependence of threshold voltage on channel width and substrate bias thus obtained is in reasonable agreement with experimental and numerical results. The effects of field doping and field oxide thickness on the threshold voltage are also taken into consideration. A comparison is made of the present analytical expression for threshold voltage with that, based on an adjustable weighting factor, of earlier analytical models.
  • Keywords
    Analytical models; Doping; Fourier transforms; Geometry; Helium; Hot carrier injection; MOS devices; MOSFET circuits; Threshold voltage; Very large scale integration;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1984.21794
  • Filename
    1484079