DocumentCode
1095098
Title
IIB-4 properties and deposition of low-pressure CVD tungsten-silicon films
Author
Monnig, K.A. ; Saraswat, Krishna C.
Volume
31
Issue
12
fYear
1984
fDate
12/1/1984 12:00:00 AM
Firstpage
1965
Lastpage
1966
Keywords
Aluminum; Conductivity; Contact resistance; Electromigration; Integrated circuit interconnections; Oxidation; Plasma temperature; Semiconductor films; Tungsten; Very large scale integration;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/T-ED.1984.21836
Filename
1484121
Link To Document