Title :
IIB-5 improved sidewall masked isolation process
Author :
Teng, C.W. ; Pollack, G. ; Scott, D. ; Hunter, W.R.
fDate :
12/1/1984 12:00:00 AM
Keywords :
Diodes; Etching; Leakage current; Oxidation; Process design; Rapid thermal processing; Silicon; Temperature measurement; Thermal stresses; Very large scale integration;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/T-ED.1984.21838
