DocumentCode :
1095127
Title :
Radiation induced thermally stimulated luminescence and conductivity in SIMOX oxides
Author :
Martini, M. ; Meinardi, F. ; Rosetta, E. ; Spinolo, G. ; Vedda, A. ; Leray, J.L. ; Paillet, P. ; Autran, J.L. ; Devine, R.A.B.
Author_Institution :
Dipartimento di Fisica, Milan Univ., Italy
Volume :
43
Issue :
3
fYear :
1996
fDate :
6/1/1996 12:00:00 AM
Firstpage :
845
Lastpage :
850
Abstract :
Thermally Stimulated Luminescence (TSL) and Conductivity (TSC) induced by X-ray irradiation in SIMOX buried oxides have been studied from room temperature up to 400°C. The characteristics of an X-ray induced TSL glow peak detected around 62°C are presented: specifically, results on the emission wavelength and trap depth are shown. The X-ray induced TSC, observed at approximately 70°C, is due to the same trapped species responsible of the TSL emission. The stability after irradiation and dose dependence of both TSL and TSC signals have also been investigated. The results have been compared with similar studies on high temperature annealed thermal SiO2 films and bulk materials
Keywords :
SIMOX; X-ray effects; buried layers; dielectric thin films; electrical conductivity; stability; thermoluminescence; 20 to 400 C; SIMOX oxides; Si-SiO2; TSC signals; TSL signals; X-ray irradiation; buried oxides; dose dependence; emission wavelength; stability; thermally stimulated conductivity; thermally stimulated luminescence; trap depth; Annealing; Luminescence; Microelectronics; Performance evaluation; Silicon; Spectroscopy; Temperature measurement; Temperature sensors; Thermal conductivity; Wavelength measurement;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/23.510723
Filename :
510723
Link To Document :
بازگشت