Title :
IIB-6 recent advances in the rapid thermal annealing of boron and BF2+implanted source-drain junctions for submicrometer CMOS technology
Author :
Vasudev, P.K. ; Schmitz, A. ; Olson, G.L.
fDate :
12/1/1984 12:00:00 AM
Keywords :
Alpha particles; Boron; CMOS technology; Conductivity; Implants; Laboratories; P-n junctions; Pulsed power supplies; Rapid thermal annealing; Temperature measurement;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/T-ED.1984.21839
