DocumentCode :
1095303
Title :
Interpretation of heavy ion cross section measurements
Author :
Petersen, E.L.
Author_Institution :
Fairfax, VI, USA
Volume :
43
Issue :
3
fYear :
1996
fDate :
6/1/1996 12:00:00 AM
Firstpage :
952
Lastpage :
959
Abstract :
This paper discusses the information about a device that is contained in the experimental heavy ion cross section curve. The width and shape of the curve are shown to be determined by intra-cell variations of charge collection, not by cell to cell variations. If we assume that there is a unique charge that must appear on the transistor terminal, then the cross section may be described in terms of variation of effective charge collection depth across the device. Contours of constant charge collection can be determined from the parameters that describe the cross section curve. The effects of diffusion can be distinguished from the other charge collection processes
Keywords :
CMOS integrated circuits; MOSFET; bipolar transistors; ion beam effects; CMOS RAMs; CMOS devices; LET spread; bipolar devices; charge collection depth; charge collection intra-cell variations; constant charge collection contours; cross section curve shape; cross section curve width; diffusion effects; heavy ion cross section measurements; transistor terminal; Argon; Energy loss; Extraterrestrial measurements; Fluctuations; Gaussian processes; Measurement standards; Shape; Space technology; Statistical distributions; Weibull distribution;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/23.510739
Filename :
510739
Link To Document :
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