DocumentCode :
1095393
Title :
Investigation of on-chip high temperature annealing of PMOS dosimeters
Author :
Kelleher, Annmarie ; Lane, William ; Adams, Leonard
Author_Institution :
Nat. Microelectron. Res. Centre, Univ. Coll. Cork, Ireland
Volume :
43
Issue :
3
fYear :
1996
fDate :
6/1/1996 12:00:00 AM
Firstpage :
997
Lastpage :
1001
Abstract :
Radiation sensitive pMOS dosimeters can measure only to a maximum dose which is determined by the type, sensitivity and irradiation conditions of the RADFET. On reaching the maximum dose, the dosimeters normally have to be replaced. The aim of this work is to study the feasibility of using on-chip poly-resistor heaters to anneal the dosimeters back to their pre-irradiation threshold voltage. This study shows that on-chip heating is a viable option to achieve post-irradiation annealing, and that the fading characteristics obtained agree with those of oven annealing from a previous study which was carried out on the NMRC RADFETs
Keywords :
MOSFET; annealing; dosimeters; semiconductor counters; PMOS dosimeters; RADFETs; fading; on-chip high temperature annealing; poly-resistor heaters; radiation sensitivity; threshold voltage; Annealing; Back; Microelectronics; Ovens; Plasma temperature; Resistors; Space heating; Space vehicles; Temperature sensors; Threshold voltage;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/23.510746
Filename :
510746
Link To Document :
بازگشت