DocumentCode :
1095469
Title :
Effects related to dose deposition profiles in integrated optics structures
Author :
West, R.H. ; Dowling, S.
Author_Institution :
Royal Mil. Coll. of Sci., Cranfield Univ., Swindon, UK
Volume :
43
Issue :
3
fYear :
1996
fDate :
6/1/1996 12:00:00 AM
Firstpage :
1044
Lastpage :
1049
Abstract :
Results from exposures of lithium tantalate and lithium niobate integrated optic structures to pulses of high energy X-rays and fast electrons are related to dose and charge deposition profiles. Anomalous effects in the tantalate are ascribed to induced electric fields
Keywords :
X-ray effects; electron beam effects; integrated optics; lithium compounds; LiNbO3; LiTaO3; anomalous effects; charge deposition profiles; dose deposition profiles; fast electrons; high energy X-rays; induced electric fields; integrated optics structures; Electron optics; Integrated optics; Lithium compounds; Lithium niobate; Optical materials; Optical pulses; Optical refraction; Optical scattering; Optical variables control; X-rays;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/23.510753
Filename :
510753
Link To Document :
بازگشت