• DocumentCode
    1096273
  • Title

    Studies of frequency dependent C-V characteristics of neutron irradiated p+-n silicon detectors

  • Author

    Li, Zheng ; Kraner, H.W.

  • Author_Institution
    Brookhaven Nat. Lab., Upton, NY, USA
  • Volume
    38
  • Issue
    2
  • fYear
    1991
  • fDate
    4/1/1991 12:00:00 AM
  • Firstpage
    244
  • Lastpage
    250
  • Abstract
    Frequency-dependent capacitance-voltage (C-V) characteristics of neutron-irradiated high-resistivity silicon P+ -n detectors have been observed up to a fluence of 8.0×10 12 n/cm2. It has been found that the frequency dependence of the deviation of the C-V characteristic (from its normal V-1/2 dependence) is strongly dependent on the ratio of the defect density to the effective doping density Nt/N´d. As the defect density approaches the effective dopant density, or Nt /N´d→1, the junction capacitance eventually assumes the value of the detector geometry capacitance at high frequencies (f⩾105 Hz), independent of voltage. A two-trap-level model that uses the concept of quasi-Fermi levels and predicts the effects of C-V frequency dependence and dopant compensation observed has been developed
  • Keywords
    nuclear electronics; semiconductor counters; P+-n detectors; Si detector; capacitance-voltage; defect density; detector geometry capacitance; dopant compensation; effective doping density; frequency dependent C-V characteristics; high frequencies; high-resistivity; junction capacitance; neutron irradiated; quasi-Fermi levels; two-trap-level; Capacitance; Capacitance-voltage characteristics; Detectors; Doping; Frequency dependence; Geometry; Predictive models; Semiconductor process modeling; Silicon; Voltage;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/23.289304
  • Filename
    289304