DocumentCode
1096610
Title
Effects of Si3 N4 , SiO, and polyimide surface passivations on GaAs MESFET amplifier RF stability
Author
Tenedorio, J.G. ; Terzian, P.A.
Author_Institution
Harris Microwave Semiconductor, Milpitas, CA
Volume
5
Issue
6
fYear
1984
fDate
6/1/1984 12:00:00 AM
Firstpage
199
Lastpage
202
Abstract
The effects of silicon nitride, silicon monoxide, and polyimide MESFET passivations on amplifier RF stability have been examined. GaAs MESFET amplifiers subjected to biased life tests show a time dependent "drift" in RF performance from turn on to hundreds of hours. These short- and long-term instabilities in performance have been correlated with surface effects. It was found that passivation with a surface dielectric such as Si3 N4 can eliminate this drift mechanism, while other dielectrics either delayed the onset of drift or had no desirable effects. Methods for deposition of these dielectrics and the relative merits of these methods are discussed.
Keywords
Dielectrics; Gallium arsenide; Life testing; MESFETs; Passivation; Polyimides; Radio frequency; Radiofrequency amplifiers; Silicon; Stability;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/EDL.1984.25886
Filename
1484262
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