DocumentCode :
1097075
Title :
Arguments for electron conduction in silicon nitride
Author :
Yau, L.D.
Author_Institution :
Intel Corporation, Aloha, OR
Volume :
5
Issue :
8
fYear :
1984
fDate :
8/1/1984 12:00:00 AM
Firstpage :
318
Lastpage :
321
Abstract :
The carrier type conducted in the nitride under + VGhas been interpreted as an electron by some and as a hole by others. Under - VGhole conduction is generally accepted. Our I-V data on the Si3N4dielectric agree with those reported in the literature but we interpret the nitride conduction as electron flow for both + VGand - VG. New arguments to support electron conduction are derived from three types of Si3N4:SiO2dual dielectric silicon-gate transistors.
Keywords :
Charge carrier processes; Current measurement; Dielectrics; Electrodes; Electron emission; Electron traps; Energy states; Silicon; Spontaneous emission; Tunneling;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/EDL.1984.25930
Filename :
1484306
Link To Document :
بازگشت