DocumentCode
1097075
Title
Arguments for electron conduction in silicon nitride
Author
Yau, L.D.
Author_Institution
Intel Corporation, Aloha, OR
Volume
5
Issue
8
fYear
1984
fDate
8/1/1984 12:00:00 AM
Firstpage
318
Lastpage
321
Abstract
The carrier type conducted in the nitride under + VG has been interpreted as an electron by some and as a hole by others. Under - VG hole conduction is generally accepted. Our I-V data on the Si3 N4 dielectric agree with those reported in the literature but we interpret the nitride conduction as electron flow for both + VG and - VG . New arguments to support electron conduction are derived from three types of Si3 N4 :SiO2 dual dielectric silicon-gate transistors.
Keywords
Charge carrier processes; Current measurement; Dielectrics; Electrodes; Electron emission; Electron traps; Energy states; Silicon; Spontaneous emission; Tunneling;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/EDL.1984.25930
Filename
1484306
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