DocumentCode
1097097
Title
Suppressing latchup in insulated gate transistors
Author
Baliga, B.J. ; Adler, M.S. ; Gray, P.V. ; Love, R.P.
Author_Institution
General Electric Company, Schenectady, NY
Volume
5
Issue
8
fYear
1984
fDate
8/1/1984 12:00:00 AM
Firstpage
323
Lastpage
325
Abstract
Two-dimensional computer modeling of insulated gate transistor (IGT) structures has been used to demonstrate the suppression of latchup in the parasitic thyristor by increasing the p-base conductivity using a deep p+ diffusion in the device cells. Experimental verification of these modeling results has been performed with thyristor latching current density of over 1000 A per cm2achieved in 600-V devices at room temperature.
Keywords
Current density; Electron emission; Helium; Insulated gate bipolar transistors; Insulation; MOSFETs; Semiconductor process modeling; Temperature; Thyristors; Voltage control;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/EDL.1984.25932
Filename
1484308
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