DocumentCode :
1097097
Title :
Suppressing latchup in insulated gate transistors
Author :
Baliga, B.J. ; Adler, M.S. ; Gray, P.V. ; Love, R.P.
Author_Institution :
General Electric Company, Schenectady, NY
Volume :
5
Issue :
8
fYear :
1984
fDate :
8/1/1984 12:00:00 AM
Firstpage :
323
Lastpage :
325
Abstract :
Two-dimensional computer modeling of insulated gate transistor (IGT) structures has been used to demonstrate the suppression of latchup in the parasitic thyristor by increasing the p-base conductivity using a deep p+ diffusion in the device cells. Experimental verification of these modeling results has been performed with thyristor latching current density of over 1000 A per cm2achieved in 600-V devices at room temperature.
Keywords :
Current density; Electron emission; Helium; Insulated gate bipolar transistors; Insulation; MOSFETs; Semiconductor process modeling; Temperature; Thyristors; Voltage control;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/EDL.1984.25932
Filename :
1484308
Link To Document :
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