DocumentCode
1097321
Title
Effect of traps on low-temperature high electron mobility transistor characteristics
Author
Chi, J.Y. ; Holmstrom, R.P. ; Salerno, J.P.
Author_Institution
GTE Laboratories Inc., Waltham, MA
Volume
5
Issue
9
fYear
1984
fDate
9/1/1984 12:00:00 AM
Firstpage
381
Lastpage
384
Abstract
The I-V characteristics of MBE-grown AlGaAs/GaAs high electron mobility transistors (HEMT´s) are studied using a bias and temperature sequence between 77 and 300 K to control trap occupancy. Low-temperature threshold voltage, transconductance, and saturation current are found to be either increased or decreased significantly relative to their 300 K values depending on the gate bias condition during cool down. This behavior is shown to be caused by variations in trap occupancy in the highly doped AlGaAs layer.
Keywords
Electron mobility; Electron traps; Epitaxial layers; Gallium arsenide; HEMTs; MODFETs; Molecular beam epitaxial growth; Temperature control; Threshold voltage; Transconductance;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/EDL.1984.25954
Filename
1484330
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