Title : 
Effect of traps on low-temperature high electron mobility transistor characteristics
         
        
            Author : 
Chi, J.Y. ; Holmstrom, R.P. ; Salerno, J.P.
         
        
            Author_Institution : 
GTE Laboratories Inc., Waltham, MA
         
        
        
        
        
            fDate : 
9/1/1984 12:00:00 AM
         
        
        
        
            Abstract : 
The I-V characteristics of MBE-grown AlGaAs/GaAs high electron mobility transistors (HEMT´s) are studied using a bias and temperature sequence between 77 and 300 K to control trap occupancy. Low-temperature threshold voltage, transconductance, and saturation current are found to be either increased or decreased significantly relative to their 300 K values depending on the gate bias condition during cool down. This behavior is shown to be caused by variations in trap occupancy in the highly doped AlGaAs layer.
         
        
            Keywords : 
Electron mobility; Electron traps; Epitaxial layers; Gallium arsenide; HEMTs; MODFETs; Molecular beam epitaxial growth; Temperature control; Threshold voltage; Transconductance;
         
        
        
            Journal_Title : 
Electron Device Letters, IEEE
         
        
        
        
        
            DOI : 
10.1109/EDL.1984.25954