DocumentCode :
1097321
Title :
Effect of traps on low-temperature high electron mobility transistor characteristics
Author :
Chi, J.Y. ; Holmstrom, R.P. ; Salerno, J.P.
Author_Institution :
GTE Laboratories Inc., Waltham, MA
Volume :
5
Issue :
9
fYear :
1984
fDate :
9/1/1984 12:00:00 AM
Firstpage :
381
Lastpage :
384
Abstract :
The I-V characteristics of MBE-grown AlGaAs/GaAs high electron mobility transistors (HEMT´s) are studied using a bias and temperature sequence between 77 and 300 K to control trap occupancy. Low-temperature threshold voltage, transconductance, and saturation current are found to be either increased or decreased significantly relative to their 300 K values depending on the gate bias condition during cool down. This behavior is shown to be caused by variations in trap occupancy in the highly doped AlGaAs layer.
Keywords :
Electron mobility; Electron traps; Epitaxial layers; Gallium arsenide; HEMTs; MODFETs; Molecular beam epitaxial growth; Temperature control; Threshold voltage; Transconductance;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/EDL.1984.25954
Filename :
1484330
Link To Document :
بازگشت