• DocumentCode
    1097321
  • Title

    Effect of traps on low-temperature high electron mobility transistor characteristics

  • Author

    Chi, J.Y. ; Holmstrom, R.P. ; Salerno, J.P.

  • Author_Institution
    GTE Laboratories Inc., Waltham, MA
  • Volume
    5
  • Issue
    9
  • fYear
    1984
  • fDate
    9/1/1984 12:00:00 AM
  • Firstpage
    381
  • Lastpage
    384
  • Abstract
    The I-V characteristics of MBE-grown AlGaAs/GaAs high electron mobility transistors (HEMT´s) are studied using a bias and temperature sequence between 77 and 300 K to control trap occupancy. Low-temperature threshold voltage, transconductance, and saturation current are found to be either increased or decreased significantly relative to their 300 K values depending on the gate bias condition during cool down. This behavior is shown to be caused by variations in trap occupancy in the highly doped AlGaAs layer.
  • Keywords
    Electron mobility; Electron traps; Epitaxial layers; Gallium arsenide; HEMTs; MODFETs; Molecular beam epitaxial growth; Temperature control; Threshold voltage; Transconductance;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/EDL.1984.25954
  • Filename
    1484330