DocumentCode :
1097470
Title :
p-Channel (Al,Ga)As/GaAs modulation-doped logic gates
Author :
Kiehl, R.A. ; Gossard, A.C.
Author_Institution :
AT&T Bell Laboratories, Murray Hill, NJ
Volume :
5
Issue :
10
fYear :
1984
fDate :
10/1/1984 12:00:00 AM
Firstpage :
420
Lastpage :
422
Abstract :
The operation of logic gates composed of modulation-doped field-effect transistors based on two-dimensional hole-gas conduction is reported for the first time. Direct coupled inverters fabricated on an MBE grown Be-doped (Al,Ga)As/GaAs wafer having a sheet density of 1.5 × 1012cm-2and a 77K mobility of 1800 cm2/V.s exhibit logic states of -0.25 and -0.98 V at 77K for a - 1-V bias. Propagation delays of 233.0 ps/gate are obtained at 77K in ring-oscillator circuits with a power dissipation of 0.31 mW/gate. Power-delay products as low as 9.1 fJ are also obtained.
Keywords :
Circuits; Epitaxial layers; FETs; Gallium arsenide; Logic gates; Propagation delay; Pulse inverters; Temperature; Transconductance; Voltage;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/EDL.1984.25970
Filename :
1484346
Link To Document :
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