• DocumentCode
    1097595
  • Title

    Two-dimensional analytical modeling of threshold voltages of short-channel MOSFET´s

  • Author

    Poole, D.R. ; Kwong, D.L.

  • Author_Institution
    University of Notre Dame, Notre Dame, IN
  • Volume
    5
  • Issue
    11
  • fYear
    1984
  • fDate
    11/1/1984 12:00:00 AM
  • Firstpage
    443
  • Lastpage
    446
  • Abstract
    We present an analytical model of the threshold voltage of a short-channel MOSFET based on an explicit solution of two-dimensional Poisson´s equation in the depletion region under the gate. This model predicts an exponential dependence on channel length (L), a linear dependence on drain voltage (VD), and an inverse dependence on oxide capacitance (εox/tox). An attractive feature of this model is that it provides an analytical closed-form expression for the threshold voltage as a function of material and device parameters (tox, VD, L, substrate bias, and substrate doping concentration) without making premature approximations. Also, this expression reduces to the corresponding expression for long-channel devices.
  • Keywords
    Analytical models; Boundary conditions; Capacitance; Doping; MOSFET circuits; Numerical analysis; Poisson equations; Predictive models; Semiconductor process modeling; Threshold voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/EDL.1984.25981
  • Filename
    1484357