• DocumentCode
    1098042
  • Title

    Critical Voltage for Electrical Degradation of GaN High-Electron Mobility Transistors

  • Author

    Joh, Jungwoo ; Del Alamo, JesÙs A.

  • Author_Institution
    Massachusetts Inst. of Technol., Cambridge
  • Volume
    29
  • Issue
    4
  • fYear
    2008
  • fDate
    4/1/2008 12:00:00 AM
  • Firstpage
    287
  • Lastpage
    289
  • Abstract
    We have found that there is a critical drain-to-gate voltage beyond which GaN high-electron mobility transistors start to degrade in electrical-stress experiments. The critical voltage depends on the detailed voltage biasing of the device during electrical stress. It is higher in the OFF state and high-power state than at VDS = 0. In addition, as |VGS| increases, the critical voltage decreases. We have also found that the stress current does not affect the critical voltage although soft degradation at low voltages takes place at high stress currents. All of our findings are consistent with a degradation mechanism based on crystallographic-defect formation due to the inverse piezoelectric effect. Hot-electron-based mechanisms seem to be in contradiction with our experimental results.
  • Keywords
    III-V semiconductors; crystal defects; high electron mobility transistors; hot carriers; piezoelectricity; wide band gap semiconductors; GaN; GaN high-electron mobility transistors; critical drain-to-gate voltage; crystallographic-defect formation; degradation mechanism; electrical degradation; electrical stress; hot-electron mechanisms; inverse piezoelectric effect; voltage biasing; DC stress; GaN; degradation; high-electron mobility transistor (HEMT); reliability;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2008.917815
  • Filename
    4470144