DocumentCode :
1098042
Title :
Critical Voltage for Electrical Degradation of GaN High-Electron Mobility Transistors
Author :
Joh, Jungwoo ; Del Alamo, JesÙs A.
Author_Institution :
Massachusetts Inst. of Technol., Cambridge
Volume :
29
Issue :
4
fYear :
2008
fDate :
4/1/2008 12:00:00 AM
Firstpage :
287
Lastpage :
289
Abstract :
We have found that there is a critical drain-to-gate voltage beyond which GaN high-electron mobility transistors start to degrade in electrical-stress experiments. The critical voltage depends on the detailed voltage biasing of the device during electrical stress. It is higher in the OFF state and high-power state than at VDS = 0. In addition, as |VGS| increases, the critical voltage decreases. We have also found that the stress current does not affect the critical voltage although soft degradation at low voltages takes place at high stress currents. All of our findings are consistent with a degradation mechanism based on crystallographic-defect formation due to the inverse piezoelectric effect. Hot-electron-based mechanisms seem to be in contradiction with our experimental results.
Keywords :
III-V semiconductors; crystal defects; high electron mobility transistors; hot carriers; piezoelectricity; wide band gap semiconductors; GaN; GaN high-electron mobility transistors; critical drain-to-gate voltage; crystallographic-defect formation; degradation mechanism; electrical degradation; electrical stress; hot-electron mechanisms; inverse piezoelectric effect; voltage biasing; DC stress; GaN; degradation; high-electron mobility transistor (HEMT); reliability;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2008.917815
Filename :
4470144
Link To Document :
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