• DocumentCode
    109853
  • Title

    Current Conduction Mechanism of Nitrogen-Doped {\\rm AlO}_{x} RRAM

  • Author

    Wanki Kim ; Sung Il Park ; Zhiping Zhang ; Wong, Simon

  • Author_Institution
    IBM T. J. Watson Res. Center, Yorktown Heights, NY, USA
  • Volume
    61
  • Issue
    6
  • fYear
    2014
  • fDate
    Jun-14
  • Firstpage
    2158
  • Lastpage
    2163
  • Abstract
    To eliminate the forming process in resistive random access memory (RRAM), we introduced nitrogen into AlOx layer to generate a moderate amount of traps inside the film. The composition of nitrogen-doped AlOx (N-AlOx) RRAM is revealed by X-ray photoelectron spectroscopy and X-ray diffraction analyses. To understand the current conduction mechanism of N-AlOx RRAM, we investigated field and temperature dependence of the charge transport. Based on the extracted trap levels of high-resistance state and various low-resistance states, the current conduction is found to be governed by Frenkel-Poole emission. An energy band model is also proposed to clarify the current conduction mechanism and switching behavior of N-AlOx RRAM.
  • Keywords
    Poole-Frenkel effect; X-ray diffraction; X-ray photoelectron spectra; aluminium compounds; band structure; nitrogen; photoelectron spectroscopy; random-access storage; Frenkel-Poole emission; RRAM; X-ray diffraction analyses; X-ray photoelectron spectroscopy; charge transport; current conduction mechanism; energy band model; extracted trap levels; resistive random access memory; Aluminum; Electrodes; Energy barrier; Nitrogen; Switches; Temperature measurement; X-ray scattering; Conduction of resistive random access memory (RRAM); Frenkel-Poole emission; Frenkel??Poole emission; energy barrier; nitrogen-doped aluminum oxide (N- ${rm AlO}_{x}$ ); nitrogen-doped aluminum oxide (N-AlOₓ); nonvolatile memory; random access memory; resistive switching; switching mechanism of resistive random access memory; switching mechanism of resistive random access memory.;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2014.2319074
  • Filename
    6812123