• DocumentCode
    1098838
  • Title

    Constraints on the application of 0.5-µm MOSFET´s to ULSI systems

  • Author

    Takeda, Eiji ; Jones, Geraint A C ; Ahmed, H.

  • Author_Institution
    Hitachi Ltd., Tokyo, Japan
  • Volume
    32
  • Issue
    2
  • fYear
    1985
  • fDate
    2/1/1985 12:00:00 AM
  • Firstpage
    322
  • Lastpage
    327
  • Abstract
    The characteristics of a MOSFET with an Leff= 0.5 µm, which is a building element of the next generation of ULSI\´s, are described from two viewpoints: 1) "deviation" from the scaling law and 2) "system level scaling," and are compared with those of 1.3-, 2-, and 3-µm design rules. In the light of the fact that further improvements in the characteristics of small-sized devices are diminishing, it is mentioned that from now on it will be more necessary to concentrate on the system-oriented approach, rather than device and process technologies. In addition, to aid the selection of a new standard for power supply voltage, the allowable operating bias regions in 0.5-µm devices are discussed.
  • Keywords
    Conductivity; Electron beams; Integrated circuit interconnections; Ion beams; Lithography; MOSFET circuits; Transistors; Ultra large scale integration; Very large scale integration; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1985.21945
  • Filename
    1484692