DocumentCode :
1098863
Title :
Performance limits of CMOS ULSI
Author :
Pfiester, James R. ; Shott, John D. ; Meindl, James D.
Author_Institution :
IBM Thomas J. Watson Research Center, Yorktown Heights, NY
Volume :
32
Issue :
2
fYear :
1985
fDate :
2/1/1985 12:00:00 AM
Firstpage :
333
Lastpage :
343
Abstract :
An analytic MOST model has been developed to calculate accurately threshold voltage at submicrometer dimensions and to predict the scaling limits of digital CMOS circuits. Salient results show that for 2-V power-supply voltages, channel lengths as small as 0.14 µm for static E/E CMOS, 0.26 µm for static E/D CMOS, 0.29 µm for dynamic transmission-gate CMOS, and 0.45 µm for static E/D NMOS circuits are possible. At submicrometer dimensions, CMOS offers as much as a 3:1 scaling advantage in minimum channel length which translates to a 5:1 improvement in gate delay when compared to NMOS. Thus CMOS is projected as the dominant ULSI technology, not only due to its well known large operating margins, low static-power dissipation and design flexibility but also due to markedly superior speed.
Keywords :
CMOS logic circuits; CMOS technology; Circuit noise; Driver circuits; Integrated circuit technology; MOS devices; Power dissipation; Semiconductor device modeling; Semiconductor device noise; Ultra large scale integration;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1985.21947
Filename :
1484694
Link To Document :
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