• DocumentCode
    1098863
  • Title

    Performance limits of CMOS ULSI

  • Author

    Pfiester, James R. ; Shott, John D. ; Meindl, James D.

  • Author_Institution
    IBM Thomas J. Watson Research Center, Yorktown Heights, NY
  • Volume
    32
  • Issue
    2
  • fYear
    1985
  • fDate
    2/1/1985 12:00:00 AM
  • Firstpage
    333
  • Lastpage
    343
  • Abstract
    An analytic MOST model has been developed to calculate accurately threshold voltage at submicrometer dimensions and to predict the scaling limits of digital CMOS circuits. Salient results show that for 2-V power-supply voltages, channel lengths as small as 0.14 µm for static E/E CMOS, 0.26 µm for static E/D CMOS, 0.29 µm for dynamic transmission-gate CMOS, and 0.45 µm for static E/D NMOS circuits are possible. At submicrometer dimensions, CMOS offers as much as a 3:1 scaling advantage in minimum channel length which translates to a 5:1 improvement in gate delay when compared to NMOS. Thus CMOS is projected as the dominant ULSI technology, not only due to its well known large operating margins, low static-power dissipation and design flexibility but also due to markedly superior speed.
  • Keywords
    CMOS logic circuits; CMOS technology; Circuit noise; Driver circuits; Integrated circuit technology; MOS devices; Power dissipation; Semiconductor device modeling; Semiconductor device noise; Ultra large scale integration;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1985.21947
  • Filename
    1484694