• DocumentCode
    1099040
  • Title

    Analysis of kink characteristics in Silicon-on-insulator MOSFET´s using two-carrier modeling

  • Author

    Kato, Koichi ; Wada, Tetsunori ; Taniguchi, Kenji

  • Author_Institution
    Toshiba Corporation, Kawasaki-shi, Japan
  • Volume
    32
  • Issue
    2
  • fYear
    1985
  • fDate
    2/1/1985 12:00:00 AM
  • Firstpage
    458
  • Lastpage
    462
  • Abstract
    An exact SOI device simulator applicable to prediction of the transistor characteristics in high-current region is developed. In the simulator, the basic two-dimensional Poisson´s and current continuity equations are numerically solved under steady-state condition. To obtain a stable and rapid convergence in the numerical scheme, a newly developed alternative step solving method is implemented. Using this simulator, the drain current kink effect, a typical phenomenon for substrate-floating devices, is exactly simulated for the first time. The physical mechanism of this phenomenon is also clarified. The simulated results indicate that kink effects are suppressed by using low-lifetime SOI substrates.
  • Keywords
    Character generation; Charge carrier processes; Dielectric materials; Differential equations; Ionization; MOSFET circuits; Partial differential equations; Poisson equations; Silicon on insulator technology; Spontaneous emission;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/T-ED.1985.21963
  • Filename
    1484710