DocumentCode
109908
Title
Amorphous Oxide Semiconductor TFTs for Displays and Imaging
Author
Nathan, Arokia ; Sungsik Lee ; Sanghun Jeon ; Robertson, John
Author_Institution
Eng. Dept., Cambridge Univ., Cambridge, UK
Volume
10
Issue
11
fYear
2014
fDate
Nov. 2014
Firstpage
917
Lastpage
927
Abstract
This paper reviews the mechanisms underlying visible light detection based on phototransistors fabricated using amorphous oxide semiconductor technology. Although this family of materials is perceived to be optically transparent, the presence of oxygen deficiency defects, such as vacancies, located at subgap states, and their ionization under illumination, gives rise to absorption of blue and green photons. At higher energies, we have the usual band-to-band absorption. In particular, the oxygen defects remain ionized even after illumination ceases, leading to persistent photoconductivity, which can limit the frame-rate of active matrix imaging arrays. However, the persistence in photoconductivity can be overcome through deployment of a gate pulsing scheme enabling realistic frame rates for advanced applications such as sensor-embedded display for touch-free interaction.
Keywords
absorption; amorphous semiconductors; photoconductivity; phototransistors; thin film transistors; active matrix imaging arrays; amorphous oxide semiconductor TFT technology; band-to-band absorption; blue photon absorption; frame-rate; gate pulsing scheme; green photon absorption; illumination; ionization; oxygen deficiency defects; photoconductivity; phototransistors; sensor-embedded display; subgap states; touch-free interaction; vacancies; visible light detection; Bonding; Charge carrier processes; Lighting; Logic gates; Stress; Thin film transistors; Threshold voltage; Oxygen vacancies; persistent photoconductivity; thin-film transistors (TFTs); transparent oxide semiconductors;
fLanguage
English
Journal_Title
Display Technology, Journal of
Publisher
ieee
ISSN
1551-319X
Type
jour
DOI
10.1109/JDT.2013.2292580
Filename
6674985
Link To Document