DocumentCode :
1099379
Title :
Hooge parameters for various FET structures
Author :
Duh, Kuang Hann ; Van Der Ziel, Aldert
Author_Institution :
General Electric Company, Syracuse, NY
Volume :
32
Issue :
3
fYear :
1985
fDate :
3/1/1985 12:00:00 AM
Firstpage :
662
Lastpage :
666
Abstract :
We present here values for the Hooge parameters αHof various FET structures that are one or more orders of magnitude smaller than the value 2 × 10-3that was first proposed. It cannot be said for certain which of these values are due to mobility-fluctuation noise and which represent number-fluctuation noise, but it seems reasonable to assume that the lowest values of αHare more likely due to mobility fluctuations.
Keywords :
Conductivity; Density estimation robust algorithm; Doping; FETs; Fluctuations; MOSFET circuits; Statistics; Tin; Voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1985.21995
Filename :
1484741
Link To Document :
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