DocumentCode :
1099500
Title :
Transient latchup in bulk CMOS with a voltage-dependent well-substrate junction capacitance
Author :
Fu, K.Y.
Author_Institution :
Motorola, Austin, TX
Volume :
32
Issue :
3
fYear :
1985
fDate :
3/1/1985 12:00:00 AM
Firstpage :
717
Lastpage :
720
Abstract :
Transient latchup in bulk CMOS with a voltage-dependent well-substrate junction capacitance under a voltage ramp is analyzed. It is found that even when the external voltage is ramping up, α1+ α2> 1, and both bipolar transistors are biased in the forward-active region, the circuit can still dynamically recover internally due to the inherently nonlinear character of the voltage-dependent substrate-well junction capacitance. Numerical results for the cases of linearly graded and step junctions are presented and some optimal conditions for preventing transient latchup are briefly discussed.
Keywords :
Bonding; Capacitance; Electrodes; Electrostatics; Insulation; Monitoring; Temperature; Testing; Transconductance; Voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/T-ED.1985.22006
Filename :
1484752
Link To Document :
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